Reducing UV induced degradation losses of solar modules with c-Si solar cells featuring dielectric passivation layers

authored by
Robert Witteck, Henning Schulte-Huxel, Boris Veith-Wolf, Malte Ruben Vogt, Fabian Kiefer, Marc Köntges, Robby Peibst, Rolf Brendel
Abstract

We report on the stability of the c-Si surface passivation quality by aluminum oxide (AIOx), silicon nitride (SiNy), and AlOx/SiNy, stacks under UV illumination. Low-temperature annealed AlOx shows a weak degradation during UV illumination, with surface recombination velocities (SRVs) of 25 cm/s after a UV dose of 275 kWh/m2. This degradation is less pronounced compared to that of fired SiNy layers with an SRV of 117 cm/s. After a firing step, the AlOx layer show even an improvement during UV illumination, resulting in stabilized SRVs of down to 1 cm/s. The improvement is mainly due to an increase of the negative fixed charge density in the AlOx layer up to a large value of -1.2×1013 cm-2.

Organisation(s)
Institute of Electronic Materials and Devices
Institute of Solid State Physics
External Organisation(s)
Institute for Solar Energy Research (ISFH)
Type
Conference contribution
Pages
1366-1370
No. of pages
5
Publication date
2017
Publication status
Published
Peer reviewed
Yes
ASJC Scopus subject areas
Renewable Energy, Sustainability and the Environment, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials
Sustainable Development Goals
SDG 7 - Affordable and Clean Energy
Electronic version(s)
https://doi.org/10.1109/PVSC.2017.8366019 (Access: Closed)