The ALU₊ concept

N-type silicon solar cells with surface-passivated screen-printed aluminum-alloyed rear emitter

verfasst von

Robert Bock, Jan Schmidt, Susanne Mau, Bram Hoex, Rolf Brendel

Abstract

Aluminum-doped p-type (Al- p⁺) silicon emitters fabricated by means of screen-printing and firing are effectively passivated by plasma-enhanced chemical-vapor deposited (PECVD) amorphous silicon (a-Si) and atomic-layer-deposited (ALD) aluminum oxide (Al₂O₃) as well as Al₂O₃/SiN_x stacks, where the silicon nitride (SiN_x) layer is deposited by PECVD. While the a-Si passivation of the Al-p⁺ emitter results in an emitter saturation current density J_0e of 246 fA/cm², the Al ₂O₃/SiN_x double layers result in emitter saturation current densities as low as 160 fA/cm², which is the lowest J_0e reported so far for screen-printed Al-doped p⁺ emitters. Moreover, the Al₂O₃ as well as the Al ₂O₃SiN_x stacks show an excellent stability during firing in a conveyor belt furnace at 900 °C. We implement our newly developed passivated Al-p⁺ emitter into an n⁺np ⁺ solar cell structure, the so-called ALU⁺cell. An independently confirmed conversion efficiency of 20% is achieved on an aperture cell area of 4 cm², clearly demonstrating the high-efficiency potential of our ALU⁺ cell concept.

Externe Organisation(en)

Institut für Solarenergieforschung GmbH (ISFH)
National University of Singapore

Typ

Artikel

Journal

IEEE Transactions on Electron Devices

Band

57

Seiten

1966-1971

Anzahl der Seiten

6

ISSN

0018-9383

Publikationsdatum

08.2010

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Elektronische, optische und magnetische Materialien, Elektrotechnik und Elektronik

Ziele für nachhaltige Entwicklung

SDG 7 – Erschwingliche und saubere Energie

Elektronische Version(en)

https://doi.org/10.1109/TED.2010.2050953 (Zugang: Geschlossen)